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Interfacial band engineering of topological insulator/Si heterojunctions for device applications

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Note:National Natural Science Foundation of China

Date of Project Approval:2015-01-01

Date of Project Initiation:2015-01-01

Scheduled completion time:2018-02-02

Date of Project Completion:2018-12-31

Pre One:Growth and band engineering of topological insulator quantum structures for thermoelectric devices

李含冬

Gender:Male Education Level:With Certificate of Graduation for Doctorate Study Alma Mater:Institute of Physics, Chinese Adademy of Sciences Degree:Doctor of Science Status:Professor School/Department:School of Materials and Energy Business Address:Room 102, East Block, Computer Science Building, Shahe Campus of UESTC, Chengdu, PRC. Contact Information: E-Mail:

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